Rapid two-dimensional self-consistent simulation of inductively coupled plasma and comparison with experimental data

Applied Physics Letters

Volumn 68, Issue 18, 1996, Pages 2499-2501

  Wise, Richard S ^a   Lymberopoulos, Dimitris P ^a   Economou, Demetre J ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000876565     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115834     Document Type: Review

References (19)

1. M. A. Lieberman and R. A. Gottscho, in Physics of Thin Films, edited by M. Francombe and J. Vossen (Academic, Orlando, FL, 1993).
2. Computational Modeling in Semiconductor Processing, edited by M. Meyyappan (Artech House, Boston, 1994).
3. D. P. Lymberopoulos and D. J. Economou, IEEE Trans. Plasma Sci. INS 23, 573 (1995).
4. R. A. Stewart, P. Vitello, and D. B. Graves, J. Vac. Sci. Technol. B AIP 12, 478 (1994).
5. A. A. Paranjpe, J. Vac. Sci. Technol. A AIP 12, 1221 (1994).
6. V. Vahedi, M. A. Lieberman, G. DiPeso, T. D. Ronglien, and D. Hewett, J. Appl. Phys. AIP 78, 1446 (1995).
7. D. J. Economou, T. J. Bartel, R. S. Wise, and D. P. Lymberopoulos, IEEE Trans. Plasma Sci. INS 23, 581 (1995).
8. P. L. G. Ventzek, M. J. Grapperhaus, and M. J. Kushner, J. Vac. Sci. Technol. B AIP 12, 3118 (1994).
9. C. Wu and F. Dai, IEEE Trans. Plasma Sci. INS 23, 563 (1995).
10. M. Surendra, Plasma Sources Sci. Technol. INS 4, 56 (1995).
11. D. F. Beale, L. J. Mahoney, A. E. Wendt, and V. Kolobov, Appl. Phys. Lett. AIP 65, 537 (1994).
12. U. Kortschagen, I. Pukropski, and L. D. Tsendin, Phys. Rev. E AIP 51, 6063 (1995).
13. M. Meyyappan and T. R. Govindan, J. Appl. Phys. 78, 6432 (1995).
14. R. P. Brinkmann, R. Furst, C. Werner, and M. Hierlemann, in Proceedings of the First International Symp. on Control, Diagnostics, and Modeling in Semiconductor Manufacturing, edited by M. Meyyappan, D. J. Economou, and S. W. Butler (The Electrochemical Society, New York, 1995), Vol. PV95-2, p. 521.
15. P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, Res. Natl. Inst. Standards Technol. 100, 427 (1995).
16. E. F. Jeager and L. Berry, Phys. Plasmas 2, AIP 6, 2597 (1995).
17. M. Riley, Sandia Report SAND95-0775, Sandia National Laboratories, Albuquerque, NM, May 1995.
18. G. Hebner (private communication).
19. V. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. INS 1, 36 (1992).