Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H2 Inductively Coupled rf Plasmas

Chemistry of Materials

Volumn 9, Issue 1, 1997, Pages 349-362

  Mackie, Neil M ^d   Dalleska, N F ^c   Castner, David G ^b   Fisher, Ellen R ^a  

^a Veterinary Dentistry and Oral Surgery   (United States)

^b University of Washington   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000810447     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm960388q     Document Type: Article

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