Surface reactivity measurements for OH radicals during deposition of SiO2 from tetraethoxysilane/O2 plasmas

Chemical Physics Letters

Volumn 267, Issue 3-4, 1997, Pages 377-383

  Bogart, K H A ^a   Cushing, J P ^a   Fisher, Ellen R ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031582015     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(97)00109-7     Document Type: Article

References (29)

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