Polymerization of fluorocarbons in reactive ion etching plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 87-95

  Stoffels, W W ^a,b   Stoffels, E ^a   Tachibana, K ^a  

^a KYOTO UNIVERSITY   (Japan)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032326789     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581016     Document Type: Article

References (26)

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