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Journal of Polymer Science, Part B: Polymer Physics

Volumn 53, Issue 8, 2015, Pages 595-603

Template-polymer commensurability and directed self-assembly block copolymer lithography

(6) Sunday, Daniel F a Ashley, Elizabeth b Wan, Lei c Patel, Kanaiyalal C c Ruiz, Ricardo c Kline, R Joseph a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b UNIVERSITY OF MARYLAND (United States)

c WESTERN DIGITAL CORPORATION (United States)

Author keywords

block copolymers; lithography; SAXS; self assembly

Indexed keywords

COPOLYMERS; ESTERS; FREE ENERGY; LITHOGRAPHY; SELF ASSEMBLY; STYRENE; X RAY SCATTERING;

BLOCK COPOLYMER LITHOGRAPHY; CHEMICAL CONTRAST; CRITICAL DIMENSION; DIRECTED SELF-ASSEMBLY; DISCLINATION DEFECTS; METHYL METHACRYLATES; SAXS; TEMPLATE POLYMERS;

BLOCK COPOLYMERS;

EID: 84924611671 PISSN: 08876266 EISSN: 10990488 Source Type: Journal
DOI: 10.1002/polb.23675 Document Type: Article

Times cited : (33)

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