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Physical Chemistry Chemical Physics

Volumn 17, Issue 5, 2015, Pages 3179-3185

Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition

(6) Zheng, Li a Cheng, Xinhong a Yu, Yuehui a Xie, Yahong b Li, Xiaolong c Wang, Zhongjian a

a INSTITUTE OF GEOLOGY AND GEOPHYSICS (China)

b Engineering IV (United States)

c Shanghai Synchrotron Radiation Facility (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84921647900 PISSN: 14639076 EISSN: None Source Type: Journal
DOI: 10.1039/c4cp04957h Document Type: Article

Times cited : (29)

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