Acid-base characterization of aluminum oxide surfaces with XPS

Journal of Physical Chemistry B

Volumn 108, Issue 19, 2004, Pages 6017-6024

  Van den Brand, J ^a   Snijders, P C ^b   Sloof, W G ^c   Terryn, H ^a   De Wit, J H W ^a,c  

^a NETHERLANDS INSTITUTE FOR METALS RESEARCH   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS ALLOYS; ANNEALING; BINDING ENERGY; CORROSION; ELECTRONIC STRUCTURE; ELECTROSTATICS; MATHEMATICAL MODELS; OXIDATION; PHOTOIONIZATION; THIN LAYER CHROMATOGRAPHY; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

AMBIENT PRESSURE; NANOCONDUCTIVE MATERIAL; OXIDE SURFACE; ROOM TEMPERATURE;

ALUMINUM;

EID: 2542466637     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp037877f     Document Type: Article

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