Structural and dielectric properties of crystalline and amorphous ZrO 2

Thin Solid Films

Volumn 486, Issue 1-2, 2005, Pages 125-128

  Vanderbilt, David ^a   Zhao, Xinyuan ^a   Ceresoli, Davide ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

Amorphous materials; Dielectric properties; Lattice dynamics; ZrO2

Indexed keywords

AMORPHOUS MATERIALS; APPROXIMATION THEORY; COMPUTER SIMULATION; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DIELECTRIC FILMS; INTERFACES (MATERIALS); LATTICE VIBRATIONS; LOW TEMPERATURE EFFECTS; MOLECULAR DYNAMICS; PERMITTIVITY; RELAXATION PROCESSES; ULTRATHIN FILMS;

CMOS TECHNOLOGY; DENSITY FUNCTIONAL THEORY (DFT); DIELECTRIC ULTRATHIN FILMS; LOCAL-DENSITY APPROXIMATION (LDA); LOW-TEMPERATURE DEPOSITION; ZRO2;

ZIRCONIA;

EID: 21844462549     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.232     Document Type: Conference Paper

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