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Volumn 11, Issue 9, 2011, Pages 3601-3607

Enhanced transport and transistor performance with oxide seeded high-κ gate dielectrics on wafer-scale epitaxial graphene

Author keywords

Al2O3; atomic layer deposition; epitaxial graphene; field effect transistor; gate dielectric; Graphene; HfO2; physical vapor deposition; SiO2

Indexed keywords

AL2O3; ATOMIC LAYER; EPITAXIAL GRAPHENE; FIELD EFFECTS; HFO2; SIO2;

EID: 80052794686     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl201358y     Document Type: Article
Times cited : (104)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.