Angle-resolved x-ray photoelectron spectroscopy of ultrathin Al2O3 films grown by atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1867-1876

  Renault, O ^a   Gosset, L G ^a   Rouchon, D ^a   Ermolieff, A ^a  

^a CEA DRT LETI   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; DEFECTS; DEPOSITION; HEATING FURNACES; INTERFACES (MATERIALS); NITROGEN; OXIDATION; RAPID THERMAL ANNEALING; SILICA; SILICATES; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

ULTRATHIN FILMS;

EID: 0036864261     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1507330     Document Type: Article

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