Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O

Central European Journal of Physics

Volumn 9, Issue 2, 2011, Pages 319-324

  Alles, Harry ^a,b   Aarik, Jaan ^a   Aidla, Aleks ^a   Fay, Aurelien ^b   Kozlova, Jekaterina ^a   Niilisk, Ahti ^a   Pärs, Martti ^a,d   Rähn, Mihkel ^a   Wiesner, Maciej ^b,c   Hakonen, Pertti ^b   Sammelselg, Väino ^a  

^a UNIVERSITY OF TARTU   (Estonia)

^b AALTO UNIVERSITY   (Finland)

^c ADAM MICKIEWICZ UNIVERSITY   (Poland)

^d UNIVERSITY OF BAYREUTH   (Germany)

Author keywords

Atomic layer depostion; Graphene; High k dielectric thin films; Nanoelectronics

Indexed keywords

EID: 79951957364     PISSN: 18951082     EISSN: 16443608     Source Type: Journal    
DOI: 10.2478/s11534-010-0040-x     Document Type: Article

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