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Volumn 73, Issue 2, 2012, Pages 308-316

Investigation of properties of Cu containing DLC films produced by PECVD process

Author keywords

A. Thin films; B. Plasma deposition; C. Infrared spectroscopy; D. Electrical properties; D. Mechanical properties

Indexed keywords

BASE PRESSURE; BONDING STATE; COMPRESSIVE RESIDUAL STRESS; DIAMOND LIKE CARBON; DLC FILM; ELECTRICAL PROPERTY; FT-IR SPECTRUM; FTIR; GAS PRESSURES; HYDROGEN CONTENTS; INDENTATION LOAD; NANOMECHANICAL PROPERTY; RAMAN ANALYSIS; RF-PECVD; VARIOUS SUBSTRATES; X-RAY DIFFRACTION TECHNIQUES;

EID: 84904785230     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2011.10.019     Document Type: Article
Times cited : (72)

References (60)
  • 29
    • 0003427458 scopus 로고
    • second edition Addison-Wesley Publishing Company Inc.
    • B.D. Cullity Element of X-ray Diffraction second edition 1978 Addison-Wesley Publishing Company Inc.
    • (1978) Element of X-ray Diffraction
    • Cullity, B.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.