Synthesis of ultrathin carbon films by direct current filtered cathodic vacuum arc

Journal of Applied Physics

Volumn 105, Issue 8, 2009, Pages

  Zhang, H S ^a   Komvopoulos, K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ATOMIC-FORCE MICROSCOPIES; CARBON ATOMS; COMPOSITION PROFILES; DEPTH PROFILES; DIFFUSION MECHANISMS; DIRECT CURRENTS; EFFECTIVE HARDNESS; FILM GROWTH MECHANISMS; FILTERED CATHODIC VACUUM ARCS; MONTE CARLO; NEAR SURFACES; OPTIMUM PROCESS CONDITIONS; SILICON SUBSTRATES; SURFACE BOMBARDMENTS; SURFACE FORCE MICROSCOPIES; X-RAY PHOTOELECTRON SPECTROSCOPIES; X-RAY REFLECTIVITIES; XPS;

ADSORPTION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; CAVITY RESONATORS; FILM GROWTH; HARDNESS; MOSFET DEVICES; SURFACE DIFFUSION; ULTRATHIN FILMS; VACUUM; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON FILMS;

EID: 65449164146     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3098254     Document Type: Article

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