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Journal of Alloys and Compounds

Volumn 509, Issue 4, 2011, Pages 1285-1293

Studies of nanostructured copper/hydrogenated amorphous carbon multilayer films

(7) Dwivedi, Neeraj a Kumar, Sushil a Ishpal, a Dayal, Saurabh a Govind, a Rauthan, C M S a Panwar, O S a

a NATIONAL PHYSICAL LABORATORY (India)

Author keywords

Low vacuum; Multilayer; Nanostructure

Indexed keywords

A-C:H FILMS; LOW VACUUM; MULTILAYER STRUCTURES; NANO-STRUCTURED; NANOSTRUCTURED MULTILAYERS; NANOSTRUCTURED SURFACE; NEAR INFRARED REGION; OPTICAL TRANSPARENCY; SECONDARY ION MASS SPECTROSCOPY; SPUTTERING TECHNIQUES; TEMPERATURE-DEPENDENT CONDUCTIVITY;

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CARBON FILMS; ELECTRIC PROPERTIES; MONOLAYERS; MORPHOLOGY; MULTILAYERS; NANOSTRUCTURES; OPTICAL MULTILAYERS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

MULTILAYER FILMS;

EID: 78649334705 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.10.016 Document Type: Article

Times cited : (51)

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