Nanostructured copper/hydrogenated amorphous carbon composite films prepared by microwave plasma-assisted deposition process from acetylene-argon gas mixtures

Reviews on Advanced Materials Science

Volumn 6, Issue 2, 2004, Pages 140-149

  Pauleau, Y ^a   Thiery F ^a   Barna, P B ^b   Misjak, F ^b   Kovacs, A ^b   Dub, S N ^c   Uglov, V V ^d   Kuleshov, A K ^d  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^c BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

^d BELARUSIAN STATE UNIVERSITY   (Belarus)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; COMPOSITE MATERIALS; COPPER; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

ACETYLENE-ARGON GAS MIXTURES; COMPOSITE FILMS; MICROWAVE PLASMA ASSISTED DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 4944245607     PISSN: 16065131     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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