Surface oxidation and reduction of CuO and Cu2O studied using XPS and XAES

Surface and Interface Analysis

Volumn 24, Issue 12, 1996, Pages 811-820

  Poulston, S ^a   Parlett, P M ^a   Stone, P ^a   Bowker, M ^a  

^a UNIVERSITY OF READING   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DIFFUSION IN SOLIDS; OXIDATION; REDUCTION; SURFACE STRUCTURE; THICK FILMS; THIN FILMS; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE OXIDATION; VACUUM ANNEALING; X RAY EXCITED AUGER ELECTRON SPECTROSCOPY (XAES);

COPPER OXIDES;

EID: 0030290754     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199611)24:12<811::AID-SIA191>3.0.CO;2-Z     Document Type: Article

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