Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning

Synchrotron Radiation News

Volumn 21, Issue 4, 2008, Pages 12-24

  Cerrina, F ^a   Isoyan, A ^a   Jiang, F ^a   Cheng, Y C ^a   Leonard, Q ^a   Wallace, J ^a   Heinrich, K ^a   Ho, A ^a   Efremov, M ^a   Nealey, P ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84903007394     PISSN: 08940886     EISSN: 19317344     Source Type: Journal    
DOI: 10.1080/08940880802268236     Document Type: Article

References (41)

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