A solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Merriam, Andrew J ^a   Bethune, Donald S ^b   Hoffnagle, John A ^b   Hinsberg, William D ^b   Jefferson, C Michael ^b   Jacob, James J ^a   Litvin, Timothy ^c  

^a Actinix   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c Kimokeo Inc   (United States)

Author keywords

Immersion lithography; Interferometric lithography; Non linear optics; Photoresist; Ultraviolet lasers

Indexed keywords

IMMERSION LITHOGRAPHY; INTERFEROMETRIC LITHOGRAPHY; NON-LINEAR OPTICS; ULTRAVIOLET LASERS;

GAUSSIAN BEAMS; LASER INTERFEROMETRY; PHOTORESISTS; SOLID STATE DEVICES; TRANSMISSION ELECTRON MICROSCOPY;

LITHOGRAPHY;

EID: 35148897263     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712210     Document Type: Conference Paper

References (7)

1. A complete review of these results may be found in K. F. Walls et al.,"A Quasi-Continuous-Wave Deep Ultraviolet Laser Source", IEEE Journ. Quant. Elect. 39, 1160 (2003).
2. J. Sakuma et al., "All-solid-state, 1-W, 5-kHz laser source below 200 nm", OSA TOPS 26, Martin M. Fejer, Hagop Injeyan, and Ursula Keller, eds. pp 89-92 (1999).
3. H. Kouta and Y. Kuwano, "Attaining 186-nm light generation in cooled BBO crystal", Opt. Lett. 24, 1230 (1999).
4. A. J. Merriam et al., "Efficient frequency conversion to 193 using cooled BBO", 2006 ASSP Conf. Proceedings, in press.
5. J. A. Hoffhagle et al., "Liquid immersion deep-ultraviolet interferometric lithography" J. Vac. Sci. Technol. B 17(6), 3306 (Nov. 1999).
6. see, e.g., M. Born and E. Worf, Principles of Optics 7ed, pg. 356 Pergammon Press, New York, 2000.
7. C. M. Jefferson, J. Hoffnagle, D.S. Bethune, W. Dyer, B. Davis, C. Larson, H. Truong and W. Hinsberg, "NEMO: A Testbed for Interferometric Immersion Lithography Capable of Producing L/S Patterns with < 30 nm Half-pitch", Conference on Electron, Ion and Photon Beams and Nanolithography, Baltimore MD, May 2006.