FEL applications in EUV lithography

Proceedings of the 27th International Free Electron Laser Conference, FEL 2005

Volumn , Issue , 2005, Pages 422-425

  Goldstein, M ^a   Lee, S H ^a   Shroff, Y A ^a   Silverman, P J ^a   Williams, D ^a   Park, H ^b   Piestrup, M A ^b   Pantell, R H ^c  

^a INTEL CORPORATION   (United States)

^b ADELPHI TECHNOLOGY INC   (United States)

^c STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EQUIPMENT INDUSTRIES; EXPLORATORY RESEARCH; EXTREME ULTRAVIOLETS; HIGH GAIN HARMONIC GENERATIONS; LITHOGRAPHIC TOOLS; NUMERICAL APERTURE; SECOND GENERATION; SEMICONDUCTOR INDUSTRY;

EXTREME ULTRAVIOLET LITHOGRAPHY; HARMONIC GENERATION; LIGHT SOURCES; LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

FREE ELECTRON LASERS;

EID: 84884657642     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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