Comparison of immersion lithography from projection and interferometric exposure tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Robertson, Stewart A ^a   Leonard, Joanne M ^a   Smith, Bruce W ^b   Bourov, Anatoly ^b  

^a ROHM AND HAAS COMPANY   (United States)

^b Amphibian Systems   (United States)

Author keywords

Aerial image synthesis; Immersion lithography; Interference lithography

Indexed keywords

AERIAL IMAGE SYNTHESIS; IMMERSION LITHOGRAPHY; INTERFERENCE LITHOGRAPHY;

DATA REDUCTION; DEMODULATION; IMAGE ANALYSIS; IMAGING SYSTEMS; INTERFEROMETERS; PROJECTION SYSTEMS; SIGNAL INTERFERENCE;

LITHOGRAPHY;

EID: 33745782956     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.658036     Document Type: Conference Paper

References (5)

1. 1 via interferometry", Proc. SPIE 5377, 1836 (2004)
2. Cropanese, F.C., Bourov, A., Fan, Y., Zhou, J., Zavyalova, L.V., and Smith, B. W., "Synthetic defocus for interferometric lithography", Proc. SPIE 5754, 1769 (2005)
3. Smith, B.W., Bourov, A., Fan, Y., Cropanese, F.C., and Hammond, P., "Amphibian XIS: an immersion lithography microstepper" Proc. SPIE 5754, 751 (2005).
4. Bourov, A., Robertson, S.A., Smith, B.W., Slocum, M., and Piscani, E., "Resist process window characterization for the 45-nm node using an interferometric immersion microstepper", Proc SPIE 6153-27, 2006.
5. Pawloski, A.R., Acheta, A. Lalovic, I., La Fontaine, B.M. and Levinson, H.J., " Characterization of line-edge roughness in photoresist using an image fading technique", Proc. SPIE 5376, pp. 414 -425, 2004.