High performance resist for EUV lithography

Microelectronic Engineering

Volumn 77, Issue 1, 2005, Pages 27-35

  Gonsalves, K E ^a   Thiyagarajan, M ^a   Choi, J H ^a   Zimmerman, Paul ^b   Cerrina, F ^c   Nealey, P ^c   Golovkina, V ^c   Wallace, J ^c   Batina, Nikola ^d  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b International SEMATECH2706 ^*  (United States)

^c UNIVERSITY OF WISCONSIN MADISON   (United States)

^d DEPARTAMENTO DE QUÍMICA   (Mexico)

Author keywords

Adamantyl methacrylate; EUV; Hydroxystyrene; Lithography; Resist

Indexed keywords

ABSORPTION; ATOMIC FORCE MICROSCOPY; ETCHING; LITHOGRAPHY; PERFORMANCE; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL);

ADAMANTYL METHACRYLATE; EXTREME ULTRAVIOLET (EUV) TECHNOLOGY; HYDROXYSTYRENE; RESIST;

ULTRAVIOLET DEVICES;

EID: 9644275581     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.08.003     Document Type: Article

References (31)

1. R.L. Brainard, J. Cobb, C.A. Cutler, J. Photopolym. Sci. Technol. 16 (3) (2003) 401.
2. P.M. Dentinger, L.L. Hunter, D.J. O'Connell, S. Gunn, D. Goods, T.H. Fedynyshyn, R.B. Goodman, D.K. Astolfi, J. Vac. Sci. Technol. B 20 (6) (2002) 2962.
3. N.N. Matsuzawa, S. Okazaki, A. Ishitani, Microlithography World, Autumn (2000) 20.
4. R.L, Brainard, C. Henderson, J. Cobb, V. Rao, J.F. Mackevich, U. Okoroanyanwu, S. Gunn, J. Chambers, S. Connolly, J. Vac. Sci. Technol. B 17 (6) (1999) 3384.
5. K.E. Gonsalves, W. He, N. Batina, D.B. Poker, L.Merhari, in: L. Merhari, K.E. Gonsalves, E.A. Dobisz, M. Angelopoulos, D. Herr (Eds.), Proceedings of the 2001 MRS Fall Meeting, Symposium "Nanopatterning-From Ultralarge Scale Integration to Biotechnology", Mat. Res. Soc. Symp. Proc., vol. 705, 2002, pp. Y4.6.1-Y4.6.6.
6. W. He, D.B. Paker, K.E. Gonsalves, N. Batina, Micro-electron. Eng. 65 (1-2) (2003) 153.
7. W. He, K.E. Gonsalves, N. Batina, D.B. Poker, E. Alexander, M. Hudson, Biomed. Microdev. 5 (2) (2003) 101.
8. H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, J. Photopolym. Sci. Technol. 7 (3) (1994) 433.
9. Synchrotron Radiation Center website www.src.wisc.edu & Center for Nanotechnology website www.nanotech. wisc.edu.
10. Sandia National Laboratories at www.sandia.gov.
11. M.A. Ali, V. Golovkina, F. Cerrina, K. Gonsalves, Microelectron. Eng. 65 (4) (2003) 454.
12. M.A. Ali, N. Batina, V. Golovkina, F. Cerrina, K. Gonsalves, Proc. SPIE 5039 (Part 2) (2003) 1173.
13. Scanning Probe Microscopy Training Notebook, Digital Instruments, Santa Barbara, USA, 1996.
14. T.E. Jewell, J.M. Rodgers, K.P. Thompson, J. Vac. Sci. Technol. B8 (1990) 1509.
15. G.E. Sommargren, Laser Focus World 32 (1996) 61.
16. S.G. Hansen, V. Dommelen, Youri, Proc. SPIE 4404 (2001) 80-88.
17. T. Evangelia, G. Evangelos, A. Panagiotis, R. loannis, G.P. Patsis, G. Nikos, C.H. Tan, Zoilo, K.Y. Lee, P.T. Le, Y. Hsu, H. Michael, Proc. SPIE 3999 (2000) 1181-1188.
18. T. Tada, T. Kanayama, A.P.G. Robinson, R.E. Palmer, M.T. Allen, J.A. Preece, K.D.M. Harris, Microelectron. Eng. 53 (2000) 425-428.
19. A.P.G. Robinson, R.E. Palmer, T. Tada, T. Kanayama, M.T. Allen, J.A. Preece, K.D.M. Harris, J. Phys. D: Appl. Phys. 32 (1999) L75-L78.
20. Dan V. Nicolau, Takahisa Taguchi, Hiroshi Taniguchi, Susumu Yoshikawa, Langmuir 15 (1999) 3845-3851.
21. W. Domke, S. Hirscher, O. Kirch, K. Kragler, K. Lowack, in: Second International EUVL Symposium, Antwerp, Belgium, 2003.
22. J.K. Chen, F.H. Ko, H.L. Chen, F.C. Chang, Jpn. J. Appl. Phys. 42 (2003) 3838.
23. J.O. Choi, J.A. Moore, J.C. Moore, J.C. Corelli, J.P. Silverman, H. Bakhru, J. Vac. Sci. Technol. B6 (1988) 2286.
24. V.N. Golovkina, P.F. Nealey, F. Cerrina, J.W. Taylor, H.H. Solak, C. David, J. Gobrecht, J. Vac. Sci. Technol. B22 (2004) 99.
25. Y. Toshiyuki, S. Hiroshi, T. Tsuneo, O. Shinji, J. Vac. Sci. Technol. B: Microelectron. Nano. Struct. 14 (6) (1996) 4216.
26. N.G Orji, M.I. Sachez, J. Raja, T.V. Vorburger, AFM characterization of semiconductor line edge roughness, in: Bhushan, Fuchs, Hosaka (Eds.), Applied Scanning Probe Methods, Springer-Verlag, Berlin, 2004.
27. M. Bishop, D. McCormack, J.S. Villarrubia, N.G. Orji, J.A. Allgair, Proc. SPIE 5375 (2004) 515-533.
28. M. Budhlall, O.L. Shaffer, E.D. Sudol, V.L. Dimonie, M.S. El-Aasser, Langmuir 19 (2003) 9968B-9972B.
29. R.L. Brainard, C. Henderson, J. Cobb, V. Rao, J.F. Mackevich, U. Okoroanyanwu, S. Gunn, J. Chambers, S. Connolly, J. Vac. Sci. Technol. B 17 (6) (1999) 3384.
30. R.L. Brainard, J. Cobb, C.A. Cutler, J. Photopolym. Sci. Technol. 16 (3) (2003) 401.
31. H.J. Butt, R. Kuropka, B. Christensen, Coll. Polym. Sci. 272 (1994) 1218.