Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 99-103

  Golovkina, V N ^a   Nealey, P F ^a   Cerrina, F ^a   Taylor, J W ^a   Solak, H H ^b   David, C ^b   Gobrecht, J ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION GRATINGS; ELECTRON BEAMS; INTERFEROMETERS; OPTICS; PHOTORESISTS; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; THIN FILMS;

ELECTRON STORAGE RINGS; EXTREME ULTRAVIOLET (EUV) LIGHT; INTERFERENCE LITHOGRAPHY (IL);

ULTRAVIOLET RADIATION;

EID: 1642310968     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1640402     Document Type: Conference Paper

References (5)

1. H. H. Solak, C. David, J. Gobrecht, L. Wang, and F. Cerrina, Microelectron. Eng. 61, 77 (2002).
2. H. H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S. O. Kim, and P. F. Nealey, Microelectron. Eng. 67-68, 56 (2003).
3. H. H. Solak, W. Li, D. He, J. Wallace, and F. Cerrina, AIP Conf. Proc. 521, 99 (2000).
4. H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, Appl. Phys. Lett. 75, 2328 (1999).
5. L. F. Thompson, C. G. Willson, and M. J. Bowden, Introduction to Microlithography (American Chemical Society, Washington, DC, 1994).