Global (volume-averaged) model of inductively coupled chlorine plasma: Influence of Cl wall recombination and external heating on continuous and pulse-modulated plasmas

Plasma Sources Science and Technology

Volumn 23, Issue 4, 2014, Pages

  Kemaneci, Efe ^a   Carbone, Emile ^a,b   Booth, Jean Paul ^c   Graef, Wouter ^a   Van Dijk, Jan ^a   Kroesen, Gerrit ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UNIV GRENOBLE ALPES   (France)

^c Centre National de la Recherche Scientifique   (France)

Author keywords

atomic and molecular physics; chemical physics and physical chemistry; plasma physics

Indexed keywords

ATOMIC PHYSICS; CHLORINE; ELECTROMAGNETIC INDUCTION; PHYSICAL CHEMISTRY;

ATOMIC AND MOLECULAR PHYSICS; CHEMICAL PHYSICS; EXTERNAL HEATING; INDUCTIVELY COUPLED CHLORINE; INDUCTIVELY-COUPLED; PLASMA PHYSICS; RADIO FREQUENCY PLASMA; WALL RECOMBINATION;

PLASMAS;

EID: 84902769637     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/23/4/045002     Document Type: Article

References (62)

1. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (New Jersey: Wiley)
2. Kanakasabapathy S K, Overzet L J, Midha V and Economou D 2001 Alternating fluxes of positive and negative ions from an ion-ion plasma Appl. Phys. Lett. 78 22-4
3. Ramamurthi B and Economou D J 2002 Two-dimensional pulsed-plasma simulation of a chlorine discharge J. Vac. Sci. Technol. A 20 467-78
4. Bodart P, Brihoum M, Cunge G, Joubert O and Sadeghi N 2011 Analysis of pulsed high-density HBr and Cl2 plasmas: impact of the pulsing parameters on the radical densities J. Appl. Phys. 110 113302
5. Guha J, Donnelly V M and Pu Y 2008 Mass and Auger electron spectroscopy studies of the interactions of atomic and molecular chlorine on a plasma reactor wall J. Appl. Phys. 103 013306
6. Kota G P, Coburn J W and Graves D B 1998 The recombination of chlorine atoms at surfaces J. Vac. Sci. Technol. A 16 270-7
7. Booth J P, Sirse N, Chabert P, Azamoum Y and Zaka ul Islam M 2011 Recombination coefficient of Cl atoms on Al2O3 wall determined by two-photon laser-induced fluorescence ICPIG-2011 Int. Conf. on Phenomena in Ionized Gases
8. Stafford L, Khare R, Guha J, Donnelly V M, Poirier J-S and Margot J 2009 Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2 J. Phys. D: Appl. Phys. 42 055206
9. Cunge G, Sadeghi N and Ramos R 2007 Influence of the reactor wall composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: II. during silicon etching J. Appl. Phys. 102 093305
10. Lee C and Lieberman M A 1995 Global model of Ar, O2, Cl2, and Ar/O2 high-density plasma discharges J. Vac. Sci. Technol. A 13 368-80
11. Meeks E, Shon J W, Ra Y and Jones P 1995 Effects of atomic chlorine wall recombination: comparison of a plasma chemistry model with experiment J. Vac. Sci. Technol. A 13 2884-9
12. Greg J and Pitchford L C 2012 Updated compilation of electron-Cl2 scattering cross sections Plasma Sources Sci. Technol. 21 032002
13. Wang Y, Zatsarinny O, Bartschat K and Booth J P 2013 Fine-structure- resolved electron collisions from chlorine atoms in the and states Phys. Rev. A 87 022703
14. Chabert P and Braithwaite N 2011 Physics of Radio-Frequency Plasmas (Cambridge: Cambridge University Press)
15. Subramonium P and Kushner M J 2002 Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism: I. Ar pulsed plasmas J. Vac. Sci. Technol. A 20 313-24
16. Sommerer T J and Kushner M J 1992 Monte Carlo-fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio-frequency discharges for plasma etching J. Vac. Sci. Technol. B 10 2179-87
17. Rogoff G L, Kramer J M and Piejak R B 1986 A model for the bulk plasma in an RF chlorine discharge IEEE Trans. Plasma Sci. 14 103-11
18. Richards A D and Sawin H H 1987 Atomic chlorine concentration measurements in a plasma etching reactor: II. A simple predictive model J. Appl. Phys. 62 799-807
19. Thorsteinsson E G and Gudmundsson J T 2010 A global (volume averaged) model of a chlorine discharge Plasma Sources Sci. Technol. 19 015001
20. Lazzaroni C, Chabert P, Lieberman M A, Lichtenberg A J and Leblanc A 2012 Analytical-numerical global model of atmospheric-pressure radio-frequency capacitive discharges Plasma Sources Sci. Technol. 21 035013
21. Monahan D D and Turner M M 2009 On the global model approximation Plasma Sources Sci. Technol. 18 045024
22. Monahan D D and Turner M M 2008 Global models of electronegative discharges: critical evaluation and practical recommendations Plasma Sources Sci. Technol. 17 045003
23. Ashida S and Lieberman M A 1997 Spatially averaged (global) model of time modulated high density chlorine plasmas Japan. J. Appl. Phys. 36 854
24. Lieberman M A and Ashida S 1996 Global models of pulse-power-modulated high-density, low-pressure discharges Plasma Sources Sci. Technol. 5 145
25. Thorsteinsson E G and Gudmundsson J T 2010 A global (volume averaged) model of a Cl2/Ar discharge: II. Pulsed power modulation J. Phys. D: Appl. Phys. 43 115202
26. Thorsteinsson E G and Gudmundsson J T 2010 The low pressure Cl2/O2 discharge and the role of ClO Plasma Sources Sci. Technol. 19 055008
27. Thorsteinsson E G and Gudmundsson J T 2010 A global (volume averaged) model of a Cl2/Ar discharge: I. Continuous power J. Phys. D: Appl. Phys. 43 115201
28. Booth J P, Azamoum Y, Sirse N and Chabert P 2012 Absolute atomic chlorine densities in a Cl2 inductively coupled plasma determined by two-photon laser-induced fluorescence with a new calibration method J. Phys. D: Appl. Phys. 45 195201
29. van Dijk J, Peerenboom K, Jimenez M, Mihailova D and van der Mullen J 2009 The plasma modelling toolkit Plasimo J. Phys. D: Appl. Phys. 42 194012
30. Kim S, Lieberman M A, Lichtenberg A J and Gudmundsson J T 2006 Improved volume-averaged model for steady and pulsed-power electronegative discharges J. Vac. Sci. Technol. A 24 2025-40
31. Braithwaite N St J and Allen J E 1988 Boundaries and probes in electronegative plasmas J. Phys. D: Appl. Phys. 21 1733
32. Booth J P and Sadeghi N 1991 Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time-resolved actinometry J. Appl. Phys. 70 611-20
33. Chantry P J 1987 A simple formula for diffusion calculations involving wall reflection and low density J. Appl. Phys. 62 1141
34. Mitchner M and Kruger C H 1973 Partially Ionized Gases (New York: Wiley)
35. Hindmarsh A C 1980 LSODE and LSODI two new initial value ordinary differential equation solvers SIGNUM Newslett. 15 10-11
36. Griffin D C, Pindzola M S, Gorczyca T W and Badnell N R 1995 Elastic and inelastic scattering of electrons from Ar and Cl Phys. Rev. A 51 2265-76
37. Tinck S, Boullart W and Bogaerts A 2009 Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma-surface simulations and experiments J. Phys. D: Appl. Phys. 42 095204
38. van der Mullen J A M 1990 Excitation equilibria in plasmas; a classification Phys. Rep. 191 109
39. Cosby P C and Helm H 1992 pp 45433-7650 Technical Report WL-TR-93-2004
40. Basner R and Becker K 2004 Experimental absolute electron impact ionization cross-sections of Cl2 New J. Phys. 6 118
41. Calandra P, O'Connor C S S and Price S D 2000 Electron-impact ionization of the chlorine molecule J. Chem. Phys. 112 10821
42. Ruf M, Barsotti S, Braun M, Hotop H and Fabrikant I 2004 Dissociative attachment and vibrational excitation in low-energy electron collisions with chlorine molecules J. Phys. B: At. Mol. Opt. Phys. 37 41
43. Christophorou L G and Olthoff J K 1999 Electron interactions with Cl2 J. Phys. Chem. Ref. Data 28 131
44. Kurepa M V and Belic D S 1978 Electron-chlorine molecule total ionisation and electron attachment cross sections J. Phys. B: At. Mol. Opt. Phys. 11 3719
45. Golovitskii A P 2000 Temperature dependence of an electron attachment to chlorine molecules Tech. Phys. 45 532
46. Kolorenč P and Horáček J 2006 Dissociative electron attachment, vibrational excitation of the chlorine molecule Phys. Rev. A 74 062703
47. Hayes T R, Wetzel R C and Freund R S 1987 Absolute electron-impact- ionization cross-section measurements of the halogen atoms Phys. Rev. A 35 578
48. Ali M A and Kim Y K 2005 Total ionization cross sections of Cl and Cl2 by electron impact Surf. Interface Anal. 37 969-72
49. Fritioff K, Sandström J, Hanstorp D, Ehlerding A, Larsson M, Collins G F, Pegg D J, Danared H, Källberg A and Le Padellec A 2003 Electron-impact detachment from Cl- Phys. Rev. A 68 012712
50. Church M J and Smith D 1978 Ionic recombination of atomic and molecular ions in flowing afterglow plasmas J. Phys. D: Appl. Phys. 11 2199
51. Lee C, Graves D B and Lieberman M A 1996 Role of etch products in polysilicon etching in a high-density chlorine discharge Plasma Chem. Plasma Process. 16 99-120
52. Španěl P, Tichý M and Smith D 1993 The reactions of positive and negative halogen ions with Cl2 and Br2 J. Chem. Phys. 98 8660-6
53. Lloyd A C 1971 A critical review of the kinetics of the dissociation-recombination reactions of fluorine and chlorine Int. J. Chem. Kinetics 3 39-68
54. Subramonium P 2003 Simulation of transients, transport in plasma processing reactors PhD Thesis University of Illinois at Urbana-Champaign
55. Thompson D L 1974 Monte Carlo classical dynamical study of the Cl + Cl2 and I + I2 systems: vibrational relaxation and atom-exchange reactions J. Chem. Phys. 60 4557
56. Ashida S, Lee C and Lieberman M A 1995 Spatially averaged (global) model of time modulated high density argon plasmas J. Vac. Sci. Technol. A 13 2498
57. Efremov A M, Kim G-H, Kim J-G and Kim C-I 2007 Self-consistent global model for inductively coupled Cl2 plasma: Comparison with experimental data and application for the etch process analysis Thin Solid Films 515 5395-402
58. Hebner G A 1996 Negative ion density in inductively coupled chlorine plasmas J. Vac. Sci. Technol. A 14 2158-62
59. Sirse N, Booth J P, Chabert P, Surzhykov A and Indelicato P 2013 Chlorine atom densities in the excited spin-orbit state measured by two-photon absorption laser-induced fluorescence in a chlorine inductively coupled plasma J. Phys. D: Appl. Phys. 46 295203
60. Ahn T H, Nakamura K and Sugai H 1996 Negative ion measurements and etching in a pulsed-power inductively coupled plasma in chlorine Plasma Sources Sci. Technol. 5 139
61. Cunge G, Vempaire D and Sadeghi N 2010 Gas convection caused by electron pressure drop in the afterglow of a pulsed inductively coupled plasma discharge Appl. Phys. Lett. 96 131501
62. Cunge G, Vempaire D, Ramos R, Touzeau M, Joubert O, Bodard P and Sadeghi N 2010 Radical surface interactions in industrial silicon plasma etch reactors Plasma Sources Sci. Technol. 19 034017