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Volumn 19, Issue 5, 2010, Pages

The low pressure Cl2/O2 discharge and the role of ClO

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EID: 78149320930     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/5/055008     Document Type: Article
Times cited : (61)

References (119)
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  • 63
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    • Basic data for modeling of electrical discharges in gases: Oxygen
    • Brown Boveri Konzernforschung, CH5405, Baden
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    • (1986) Report KLR-11C
    • Eliasson, B.1    Kogelshatz, U.2
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    • PhD Thesis University of Illinois at Urbana-Champaign
    • Subramonium P 2003 PhD Thesis University of Illinois at Urbana-Champaign
    • (2003)
    • Subramonium, P.1
  • 85
    • 0001890931 scopus 로고
    • ed M Francombe and J Vossen New York: Academic
    • Lieberman M A and Gottscho R A 1994 Physics of Thin Films vol 18 ed M Francombe and J Vossen (New York: Academic) pp 1-119
    • (1994) Physics of Thin Films , vol.18 , pp. 1-119
    • Lieberman, M.A.1    Gottscho, R.A.2
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    • 0003610530 scopus 로고    scopus 로고
    • RH-21-2002 Science Institute, University of Iceland
    • Gudmundsson J T 2002 Technical Report RH-21-2002 Science Institute, University of Iceland
    • (2002) Technical Report
    • Gudmundsson, J.T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.