Self-consistent global model for inductively coupled Cl2 plasma: Comparison with experimental data and application for the etch process analysis

Thin Solid Films

Volumn 515, Issue 13, 2007, Pages 5395-5402

  Efremov, A M ^a   Kim, Gwan Ha ^b   Kim, Jong Gyu ^b   Kim, Chang Il ^b  

^a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

^b Chung Ang University   (South Korea)

Author keywords

Cl2 plasma; Dissociation; Etch rate; Rate coefficient

Indexed keywords

CHLORINE COMPOUNDS; ELECTRON ENERGY ANALYZERS; ETCHING; MATHEMATICAL MODELS; MAXWELL EQUATIONS; PLASMA DIAGNOSTICS;

ETCH PROCESS ANALYSIS; ETCH RATES; RATE COEFFICIENT; SELF CONSISTENT GLOBAL MODELS;

INDUCTIVELY COUPLED PLASMA;

EID: 33947727396     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.027     Document Type: Article

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