Analyticalnumerical global model of atmospheric-pressure radio-frequency capacitive discharges

Plasma Sources Science and Technology

Volumn 21, Issue 3, 2012, Pages

  Lazzaroni, C ^a,c   Chabert, P ^a   Lieberman, M A ^b   Lichtenberg, A J ^b   Leblanc, A ^b  

^a Centre National de la Recherche Scientifique   (France)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATED PROCESS; CAPACITIVE DISCHARGES; COMPUTATIONAL TIME; CURRENT-DRIVEN; DISCHARGE COMPOSITION; DISCHARGE PARAMETERS; ELECTRICAL CHARACTERISTIC; ELECTRON POWER; FAST SOLUTIONS; FEED GAS; FLUID MODELS; GASPHASE; GLOBAL MODELS; NUMERICAL SOLUTION; PARTICLE BALANCE; RADIO FREQUENCIES; RATE COEFFICIENTS; RF-POWER; SPACE AND TIME; TIME VARYING; TIME-SCALES;

ATMOSPHERIC CHEMISTRY; ELECTRON TEMPERATURE; HELIUM; NITROGEN;

CHEMICAL ANALYSIS;

EID: 84862209513     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/3/035013     Document Type: Article

References (25)

1. Lieberman M and Lichtenberg A 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
2. Stafford D S and Kushner M J 2004 J. Appl. Phys. 96 2451
3. Iza F, Lee J K and Kong M G 2007 Phys. Rev. Lett. 99 075004 (Pubitemid 47294610)
4. Liu D W, Iza F and Kong M G 2008 Appl. Phys. Lett. 93 261503
5. Martens T, Bogaerts A, Brok W J M and Dijk P V 2008 Appl. Phys. Lett. 92 041504 (Pubitemid 351198807)
6. Hong Y J, Moon M, Iza F, Kim G C and Lee J K 2008 J. Phys. D: Appl. Phys. 41 245208
7. 2 mixtures Thesis Queen's University Belfast
8. Waskoenig J, Niemi K, Knake N, Graham L M, Reuter S, von der Gathen V S and Gans T 2010 Plasma Sources Sci. Technol. 19 045018
9. Park G, Lee H, Kim G and Lee J K 2008 Plasma Process. Polym. 5 569
10. Park G, Hong Y, Lee H, Sim J and Lee J K 2010 Plasma Process. Polym. 7 281
11. Liu D X, Rong M, Wang X, Iza F, Rong M Z and Kong M G 2010 Plasma Process. Polym. 7 846
12. Lee H W, Park G W, Seo Y S, Im Y H, Shim S B and Lee H J 2011 J. Phys. D: Appl. Phys. 44 053001
13. Godyak V A and Khanneh A S 1986 IEEE Trans. Plasma Sci. 14 112
14. Hagelaar G J M and Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722 (Pubitemid 41609425)
15. Chabert P and Braithwaite N 2011 Physics of Radiofrequency Plasmas (Cambridge: Cambridge University Press)
16. Makabe T and Petrovic Z L 2006 Plasma Electronics: Applications in Microelectronic Device Fabrication (London: Taylor and Francis)
17. Lee J K, Babaeva N Y, Kim H C, Manuilenko O V and Shon J W 2004 IEEE Trans. Plasma Sci. 32 47
18. Morgan W L, Boeuf J P and Pitchford L C 2003 The Siglo Database, CPAT and Kinema Software http://www.kinema.com
19. 2, NO and N Unclassified DoD Report
20. 2 JILA Information Center Report
21. Thorsteinsson E G and Gudmundsson J T 2010 Plasma Sources Sci. Technol 19 055008
22. Gudmundsson J T and Thorsteinsson E G 2007 Plasma Sources Sci. Technol 16 399 (Pubitemid 46646763)
23. Bronold F X, Matyash K, Tskhakaya D, Schneider R and Fehske H 2007 J. Phys. D: Appl. Phys. 40 6583 (Pubitemid 350006727)
24. Thomas L D and Nesbit R K 1975 Phys. Rev. A 12 1729
25. Smirnov N M 1981 Physics of Weakly Ionized Gases (Moscow: Mir)