Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure

Theoretical Chemistry Accounts

Volumn 133, Issue 1, 2014, Pages 3-11

  Travis, Curtisha D ^a   Adomaitis, Raymond A ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

Alumina; Atomic layer deposition; Numerical simulation; Reaction kinetics modeling; Statistical mechanics; Transition state theory

Indexed keywords

EID: 84897601451     PISSN: 1432881X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00214-013-1414-0     Document Type: Article

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