Modelling the deposition of high-k dielectric films by first principles

Journal of Electroceramics

Volumn 13, Issue 1-3, 2004, Pages 117-120

  Elliott, Simon D ^a   Pinto, Henry P ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

Ab initio calculations; Alumina; Atomic Layer Deposition; High k dielectrics; Oxide surface

Indexed keywords

ADSORPTION; COMPUTATIONAL METHODS; COMPUTER SIMULATION; COMPUTER SOFTWARE; DECOMPOSITION; DEPOSITION; MATHEMATICAL MODELS; MOSFET DEVICES; PROBABILITY DENSITY FUNCTION; SURFACE REACTIONS;

AB INITO CALCULATIONS; ATOMIC LAYER DEPOSITION (ALD); OXIDE SURFACES; REACTION ENERGIES;

DIELECTRIC FILMS;

EID: 17044370773     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10832-004-5086-y     Document Type: Conference Paper

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