IR and NMR study of the chemisorption of ammonia on trimethylaluminum-modified silica

Journal of Physical Chemistry B

Volumn 104, Issue 28, 2000, Pages 6599-6609

  Puurunen, Riikka L ^a,b   Root, Andrew ^c   Haukka, Suvi ^b   Iiskola, Eero I ^b   Lindblad, Marina ^c   Krause, A Outi I ^a  

^a AALTO UNIVERSITY   (Finland)

^b Microchemistry Ltd   (Finland)

^c Fortum Oil and Gas Oy   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; HYDROGEN; INFRARED SPECTROSCOPY; METHANE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; POROUS MATERIALS; SILICA; SILICON; SURFACES; TEMPERATURE;

ALUMINUM NITRIDE; AMINO GROUPS; ATOMIC LAYER CHEMICAL VAPOR DEPOSITION; LIGAND EXCHANGE; METHYL GROUPS; POROUS SILICA; TRIMETHYLALUMINUM;

AMMONIA;

EID: 0034229422     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp000454i     Document Type: Article

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