SCOPUS 정보 검색 플랫폼

Plasma Physics and Controlled Fusion

Volumn 55, Issue 12, 2013, Pages

Capacitively coupled radio-frequency plasmas excited by tailored voltage waveforms

(4) Lafleur, T a Delattre, P A a Johnson, E V b Booth, J P a

a ECOLE POLYTECHNIQUE (France)

b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED; CAPACITIVELY COUPLED PLASMAS; HARMONIC FREQUENCY; IMPROVED CONTROLS; MATERIALS PROCESSING; PARTICLE-IN-CELL SIMULATIONS; RADIO FREQUENCY PLASMA; RESEARCH APPROACH;

IONS; PLASMA DENSITY; PLASMAS;

ELECTRIC DISCHARGES;

EID: 84889032436 PISSN: 07413335 EISSN: 13616587 Source Type: Journal
DOI: 10.1088/0741-3335/55/12/124002 Document Type: Article

Times cited : (30)

References (41)

1
- 84889416744
- 10.1002/0471724254
- Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (Hoboken, NJ: Wiley)
- (2005) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

2
- 84925089126
- 10.1017/CBO9780511974342
- Chabert P and Braithwaite N 2011 Physics of Radio-Frequency Plasmas (Cambridge: Cambridge University Press)
- (2011) Physics of Radio-Frequency Plasmas
- Chabert, P.¹ Braithwaite, N.²

3
- 2442535093
- 10.1063/1.1690096
- Schmidt H, Sansonnens L, Howling A A, Hollenstein Ch, Elyaakoubi M and Schmitt J P M 2004 J. Appl. Phys. 95 4559
- (2004) J. Appl. Phys. , vol.95 , pp. 4559
- Schmidt, H.¹ Sansonnens, L.² Howling, A.A.³ Hollenstein, Ch.⁴ Elyaakoubi, M.⁵ Schmitt, J.P.M.⁶

4
- 19744382874
- Ion energy uniformity in high-frequency capacitive discharges
- DOI 10.1063/1.1848183, 021501
- Perret A, Chabert P, Jolly J and Booth J P 2005 Appl. Phys. Lett. 86 021501 (Pubitemid 40211631)
- (2005) Applied Physics Letters , vol.86 , Issue.2 , pp. 0215011-0215013
- Perret, A.¹ Chabert, P.² Jolly, J.³ Booth, J.-P.⁴

5
- 0030549049
- Sheath impedance effects in very high frequency plasma experiments
- DOI 10.1116/1.579908
- Schwarzenbach W, Howling A A, Fivaz M, Brunner S and Hollenstein Ch 1996 J. Vac. Sci. Technol. A 14 132 (Pubitemid 126024978)
- (1996) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.14 , Issue.1 , pp. 132-138
- Schwarzenbach, W.¹ Howling, A.A.² Fivaz, M.³ Brunner, S.⁴ Hollenstein, C.⁵

6
- 49749112887
- 10.1088/0022-3727/41/16/165202 0022-3727 165202
- Heil B G, Czarnetzki U, Brinkmann R P and Mussenbrock T 2008 J. Phys. D: Appl. Phys. 41 165202
- (2008) J. Phys. D: Appl. Phys. , vol.41 , Issue.16
- Heil, B.G.¹ Czarnetzki, U.² Brinkmann, R.P.³ Mussenbrock, T.⁴

7
- 50249112184
- 10.1109/TPS.2004.924575 0093-3813
- Heil B G, Schulze J, Mussenbrock T, Brinkmann R P and Czarnetzki U 2008 IEEE Trans. Plasma Sci. 36 1404
- (2008) IEEE Trans. Plasma Sci. , vol.36 , pp. 1404
- Heil, B.G.¹ Schulze, J.² Mussenbrock, T.³ Brinkmann, R.P.⁴ Czarnetzki, U.⁵

8
- 65449156918
- 0022-3727 092005
- Schulze J, Schüngel E and Czarnetzki U 2009 J. Phys. D: Appl. Phys. 42 092005
- (2009) J. Phys. D: Appl. Phys. , vol.42 , Issue.9
- Schulze, J.¹ Schüngel, E.² Czarnetzki, U.³

9
- 63649163274
- 10.1088/0022-3727/42/2/025205 0022-3727 025205
- Donkó Z, Schulze J, Heil B G and Czarnetzki U 2009 J. Phys. D: Appl. Phys. 42 025205
- (2009) J. Phys. D: Appl. Phys. , vol.42 , Issue.2
- Donkó, Z.¹ Schulze, J.² Heil, B.G.³ Czarnetzki, U.⁴

10
- 84874888135
- 10.1088/0022-3727/46/13/135201 0022-3727 135201
- Lafleur T, Chabert P and Booth J P 2013 J. Phys. D: Appl. Phys. 46 135201
- (2013) J. Phys. D: Appl. Phys. , vol.46 , Issue.13
- Lafleur, T.¹ Chabert, P.² Booth, J.P.³

11
- 79551699418
- 10.1088/0963-0252/20/1/015017 0963-0252 015017
- Schulze J, Schüngel E, Donkó Z and Czarnetzki U 2011 Plasma Sources Sci. Technol. 20 015017
- (2011) Plasma Sources Sci. Technol. , vol.20 , Issue.1
- Schulze, J.¹ Schüngel, E.² Donkó, Z.³ Czarnetzki, U.⁴

12
- 84866359036
- 10.1088/0022-3727/45/39/395203 0022-3727 395203
- Lafleur T and Booth J P 2012 J. Phys. D: Appl. Phys. 45 395203
- (2012) J. Phys. D: Appl. Phys. , vol.45 , Issue.39
- Lafleur, T.¹ Booth, J.P.²

13
- 84866842512
- 10.1063/1.4754692 124104
- Lafleur T, Delattre P A, Johnson E V and Booth J P 2012 Appl. Phys. Lett. 101 124104
- (2012) Appl. Phys. Lett. , vol.101
- Lafleur, T.¹ Delattre, P.A.² Johnson, E.V.³ Booth, J.P.⁴

14
- 84878404647
- 10.1088/0022-3727/46/23/235201 0022-3727 235201
- Delattre P A, Lafleur T, Johnson E V and Booth J P 2013 J. Phys. D: Appl. Phys. 46 235201
- (2013) J. Phys. D: Appl. Phys. , vol.46 , Issue.23
- Delattre, P.A.¹ Lafleur, T.² Johnson, E.V.³ Booth, J.P.⁴

15
- 80051641825
- 10.1088/0963-0252/20/4/045007 0963-0252 045007
- Schulze J, Donkó Z, Schüngel E and Czarnetzki U 2011 Plasma Sources Sci. Technol. 20 045007
- (2011) Plasma Sources Sci. Technol. , vol.20 , Issue.4
- Schulze, J.¹ Donkó, Z.² Schüngel, E.³ Czarnetzki, U.⁴

16
- 84868022302
- 10.1088/0022-3727/45/46/465205 0022-3727 465205
- Korolov I, Donkó Z, Czarnetzki U and Schulze J 2012 J. Phys. D: Appl. Phys. 45 465205
- (2012) J. Phys. D: Appl. Phys. , vol.45 , Issue.46
- Korolov, I.¹ Donkó, Z.² Czarnetzki, U.³ Schulze, J.⁴

17
- 84877102559
- 10.1063/1.4802241 154104
- Lafleur T and Booth J P 2013 Appl. Phys. Lett. 102 154104
- (2013) Appl. Phys. Lett. , vol.102
- Lafleur, T.¹ Booth, J.P.²

18
- 84859539342
- 10.1063/1.3699222 133504
- Johnson E V, Delattre P A and Booth J P 2012 Appl. Phys. Lett. 100 133504
- (2012) Appl. Phys. Lett. , vol.100
- Johnson, E.V.¹ Delattre, P.A.² Booth, J.P.³

19
- 84875222746
- 10.1016/j.vacuum.2012.02.020
- Hrunski D et al 2013 Vacuum 87 114
- (2013) Vacuum , vol.87 , pp. 114
- Hrunski, D.¹

20
- 84874101642
- 10.1063/1.4773540 015001
- Lafleur T, Delattre P A, Booth J P, Johnson E V and Dine S 2013 Rev. Sci. Instrum. 84 015001
- (2013) Rev. Sci. Instrum. , vol.84
- Lafleur, T.¹ Delattre, P.A.² Booth, J.P.³ Johnson, E.V.⁴ Dine, S.⁵

21
- 34247487447
- Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing
- DOI 10.1088/0963-0252/16/2/007, PII S0963025207365936, 007
- Patterson M M, Chu H Y and Wendt A E 2007 Plasma Sources Sci. Technol. 16 257 (Pubitemid 46646745)
- (2007) Plasma Sources Science and Technology , vol.16 , Issue.2 , pp. 257-264
- Patterson, M.M.¹ Chu, H.-Y.² Wendt, A.E.³

22
- 1942542301
- 10.1063/1.1652247
- Piejak R B, Godyak V A, Garner R, Alexandrovich B M and Sternberg N 2004 J. Appl. Phys. 95 3785
- (2004) J. Appl. Phys. , vol.95 , pp. 3785
- Piejak, R.B.¹ Godyak, V.A.² Garner, R.³ Alexandrovich, B.M.⁴ Sternberg, N.⁵

23
- 27744597302
- Hairpin resonator probe measurements in RF plasmas
- DOI 10.1088/0963-0252/14/4/012, PII S0963025205076176
- Piejak R B, Al-Kuzee J and Braithwaite N St J 2005 Plasma Sources Sci. Technol. 14 734 (Pubitemid 41609426)
- (2005) Plasma Sources Science and Technology , vol.14 , Issue.4 , pp. 734-743
- Piejak, R.B.¹ Al-Kuzee, J.² Braithwaite, N.St.J.³

24
- 0346979035
- 10.1016/S0168-1176(97)00285-1
- Hamers E A G, van Sark W G J H M, Bezemer J, Goedheer W J and van der Weg W F 1998 Int. J. Mass Spectrum. Ion Process. 173 91
- (1998) Int. J. Mass Spectrum. Ion Process. , vol.173 , pp. 91
- Hamers, E.A.G.¹ Van Sark, W.G.J.H.M.² Bezemer, J.³ Goedheer, W.J.⁴ Van Der Weg, W.F.⁵

25
- 36048988493
- Comparison of measurements and particle-in-cell simulations of ion energy distribution functions in a capacitively coupled radio-frequency discharge
- DOI 10.1063/1.2795634
- O'Connell D, Zorat R, Ellingboe A R and Turner M M 2007 Phys. Plasmas 14 103510 (Pubitemid 350098054)
- (2007) Physics of Plasmas , vol.14 , Issue.10 , pp. 103510
- O'Connell, D.¹ Zorat, R.² Ellingboe, A.R.³ Turner, M.M.⁴

26
- 0003631533
- Birdsall C K and Langdon A B 1985 Plasma Physics Via Computer Simulation (New York: McGraw-Hill)
- (1985) Plasma Physics Via Computer Simulation
- Birdsall, C.K.¹ Langdon, A.B.²

27
- 0029632851
- 10.1016/0010-4655(94)00171-W 0010-4655
- Vahedi V and Surendra M 1995 Comput. Phys. Commun. 87 179
- (1995) Comput. Phys. Commun. , vol.87 , pp. 179
- Vahedi, V.¹ Surendra, M.²

28
- 84862095724
- 10.1063/1.4712128 194101
- Lafleur T, Boswell R W and Booth J P 2012 Appl. Phys. Lett. 100 194101
- (2012) Appl. Phys. Lett. , vol.100
- Lafleur, T.¹ Boswell, R.W.² Booth, J.P.³

29
- 84873676964
- 10.1063/1.4775084 013507
- Turner M M, Derzsi A, Donkó Z, Eremin D, Kelly S J, Lafleur T and Mussenbrock T 2013 Phys. Plasmas 20 013507
- (2013) Phys. Plasmas , vol.20
- Turner, M.M.¹ Derzsi, A.² Donkó, Z.³ Eremin, D.⁴ Kelly, S.J.⁵ Lafleur, T.⁶ Mussenbrock, T.⁷

30
- 0000875694
- Simultaneous Potential and Circuit Solution for Two-Dimensional Bounded Plasma Simulation Codes
- DOI 10.1006/jcph.1996.5591, PII S0021999196955916
- Vahedi V and DiPeso G 1997 J. Comput. Phys. 131 149 (Pubitemid 127341387)
- (1997) Journal of Computational Physics , vol.131 , Issue.1 , pp. 149-163
- Vahedi, V.¹ Dipeso, G.²

31
- 0032690466
- 10.1088/0963-0252/8/3/201 0963-0252 201
- Phelps A V and Petrović Z Lj 1999 Plasma Sources Sci. Technol. 8 R21
- (1999) Plasma Sources Sci. Technol. , vol.8 , Issue.3 , pp. 21
- Phelps, A.V.¹ Lj, P.Z.²

32
- 36449005458
- 10.1063/1.357820
- Phelps A V 1994 J. Appl. Phys. 76 747
- (1994) J. Appl. Phys. , vol.76 , pp. 747
- Phelps, A.V.¹

33
- 79953695347
- 10.1088/0963-0252/20/2/024010 0963-0252 024010
- Czarnetzki U, Schulze J, Schüngel E and Donkó Z 2011 Plasma Sources Sci. Technol. 20 024010
- (2011) Plasma Sources Sci. Technol. , vol.20 , Issue.2
- Czarnetzki, U.¹ Schulze, J.² Schüngel, E.³ Donkó, Z.⁴

34
- 53349091953
- 10.1088/0022-3727/41/19/195212 0022-3727 195212
- Schulze J, Heil B G, Luggenhölscher D, Brinkmann R P and Czarnetzki U 2008 J. Phys. D.: Appl. Phys. 41 195212
- (2008) J. Phys. D.: Appl. Phys. , vol.41 , Issue.19
- Schulze, J.¹ Heil, B.G.² Luggenhölscher, D.³ Brinkmann, R.P.⁴ Czarnetzki, U.⁵

35
- 84870195435
- 10.1088/0741-3335/54/12/124003 0741-3335 124003
- Donkó Z, Schulze J, Czarnetzki, Derzsi A, Hartmann P, Korolov I and Schüngel E 2012 Plasma Phys. Control. Fusion 54 124003
- (2012) Plasma Phys. Control. Fusion , vol.54 , Issue.12
- Donkó, Z.¹ Schulze, J.² Czarnetzki³ Derzsi, A.⁴ Hartmann, P.⁵ Korolov, I.⁶ Schüngel, E.⁷

36
- 0042769375
- 10.1063/1.1592617
- Perret A, Chabert P, Booth J P, Jolly J, Guillon J and Auvray Ph 2003 Appl. Phys. Lett. 83 243
- (2003) Appl. Phys. Lett. , vol.83 , pp. 243
- Perret, A.¹ Chabert, P.² Booth, J.P.³ Jolly, J.⁴ Guillon, J.⁵ Auvray, Ph.⁶

37
- 0025468437
- Numerical modeling of low-pressure RF plasmas
- DOI 10.1109/27.57527
- Vender D and Boswell R W 1990 IEEE Trans. Plasma Sci. 18 725 (Pubitemid 20739176)
- (1990) IEEE Transactions on Plasma Science , vol.18 , Issue.4 , pp. 725-732
- Vender David¹ Boswell Rod, W.²

38
- 0036672649
- Standing wave and skin effects in large-area, high-frequency capacitive discharges
- DOI 10.1088/0963-0252/11/3/310, PII S0963025202368464
- Lieberman M A, Booth J P, Chabert P, Rax J M and Turner M M 2002 Plasma Sources Sci. Technol. 11 283 (Pubitemid 35023198)
- (2002) Plasma Sources Science and Technology , vol.11 , Issue.3 , pp. 283-293
- Lieberman, M.A.¹ Booth, J.P.² Chabert, P.³ Rax, J.M.⁴ Turner, M.M.⁵

39
- 64149097586
- 10.1063/1.3110056 131501
- Donkó Z, Schulze J, Czarnetzki U and Luggenhölscher D 2009 Appl. Phys. Lett. 94 131501
- (2009) Appl. Phys. Lett. , vol.94
- Donkó, Z.¹ Schulze, J.² Czarnetzki, U.³ Luggenhölscher, D.⁴

40
- 36449004205
- 10.1063/1.351283
- Miller P A, Anderson H and Splichal M P 1992 J. Appl. Phys. 71 1171
- (1992) J. Appl. Phys. , vol.71 , pp. 1171
- Miller, P.A.¹ Anderson, H.² Splichal, M.P.³

41
- 84889054243
- Thin film deposition with tailored voltage waveforms: Material questions and practical answers
- Johnson E V, Bruneau B, Delattre P A, Lafleur T and Booth J P 2012 Thin film deposition with tailored voltage waveforms: material questions and practical answers 4th Workshop on Radio Frequency Discharges (WRF-2013) (Presu'ile de Giens, France, 29-31 May 2013)
- (2012) 4th Workshop on Radio Frequency Discharges (WRF-2013)
- Johnson, E.V.¹ Bruneau, B.² Delattre, P.A.³ Lafleur, T.⁴ Booth, J.P.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.