-
1
-
-
0023421273
-
-
H. Curtins, N. Wyrsch, M. Favre, and A. V. Shah, Plasma Chem. Plasma Process. 7, 267 (1987).
-
(1987)
Plasma Chem. Plasma Process
, vol.7
, pp. 267
-
-
Curtins, H.1
Wyrsch, N.2
Favre, M.3
Shah, A.V.4
-
3
-
-
84957342596
-
-
A. A. Howling, J.-L. Dorier, Ch. Hollenstein, U. Kroll, and F. Finger, J. Vac. Sci. Technol. A 10, 1080 (1992).
-
(1992)
J. Vac. Sci. Technol. A
, vol.10
, pp. 1080
-
-
Howling, A.A.1
Dorier, J.-L.2
Hollenstein, Ch.3
Kroll, U.4
Finger, F.5
-
5
-
-
85033843201
-
-
The Electrochemical Society, Pennington, NJ
-
M. J. Colgan, M. Meyyappan, and T. R. Govindan, 10th Symposium on Plasma Processing (The Electrochemical Society, Pennington, NJ, 1994).
-
(1994)
10th Symposium on Plasma Processing
-
-
Colgan, M.J.1
Meyyappan, M.2
Govindan, T.R.3
-
8
-
-
84897583671
-
-
U. Kroll, Y. Ziegler, J. Meier, H. Keppner, and A. Shah, Mater Res. Soc. Symp. Proc. 336, 115 (1994).
-
(1994)
Mater Res. Soc. Symp. Proc.
, vol.336
, pp. 115
-
-
Kroll, U.1
Ziegler, Y.2
Meier, J.3
Keppner, H.4
Shah, A.5
-
9
-
-
0000358828
-
-
F. Finger, P. Hapke, M. Luysberg, R. Carius, H. Wagner, and M. Scheib, Appl. Phys. Lett. 65, 2588 (1994).
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 2588
-
-
Finger, F.1
Hapke, P.2
Luysberg, M.3
Carius, R.4
Wagner, H.5
Scheib, M.6
-
10
-
-
12844282265
-
-
J. Meier, R. Flückiger, H. Keppner, and A. Shah, Appl. Phys. Lett. 65, 860 (1994).
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 860
-
-
Meier, J.1
Flückiger, R.2
Keppner, H.3
Shah, A.4
-
13
-
-
0001383489
-
-
V. Vahedi, C. K. Birdsall, M. A. Lieberman, G. DiPeso, and T. D. Rognlien, Phys. Fluids B 5, 2719 (1993).
-
(1993)
Phys. Fluids B
, vol.5
, pp. 2719
-
-
Vahedi, V.1
Birdsall, C.K.2
Lieberman, M.A.3
DiPeso, G.4
Rognlien, T.D.5
-
15
-
-
0000153846
-
-
J. Dutta, U. Kroll, P. Chabloz, A. Shah, A. A. Howling, J.-L. Dorier, and Ch. Hollenstein, J. Appl. Phys. 72, 3220 (1992).
-
(1992)
J. Appl. Phys.
, vol.72
, pp. 3220
-
-
Dutta, J.1
Kroll, U.2
Chabloz, P.3
Shah, A.4
Howling, A.A.5
Dorier, J.-L.6
Hollenstein, Ch.7
-
17
-
-
0001096326
-
-
M. Fivaz, S. Brunner, W. Schwarzenbach, A. A. Howling, and Ch. Hollenstein, Plasma Sources Sci. Technol. 4, 373 (1995).
-
(1995)
Plasma Sources Sci. Technol.
, vol.4
, pp. 373
-
-
Fivaz, M.1
Brunner, S.2
Schwarzenbach, W.3
Howling, A.A.4
Hollenstein, Ch.5
-
18
-
-
84856126519
-
-
S. Veprek, F.-A. Sarrott, S. Rambert, and E. Taglauer, J. Vac. Sci. Technol. A 7, 2614 (1989).
-
(1989)
J. Vac. Sci. Technol. A
, vol.7
, pp. 2614
-
-
Veprek, S.1
Sarrott, F.-A.2
Rambert, S.3
Taglauer, E.4
-
19
-
-
3943055851
-
-
J. Perrin, Y. Takeda, N. Hirano, H. Matsuura, and A. Matsuda, Jap. J. Appl. Phys. 28, 5 (1989).
-
(1989)
Jap. J. Appl. Phys.
, vol.28
, pp. 5
-
-
Perrin, J.1
Takeda, Y.2
Hirano, N.3
Matsuura, H.4
Matsuda, A.5
-
21
-
-
36549100807
-
-
K. Köhler, J. W. Coburn, D. E. Horne, E. Kay, and J. H. Keller, J. Appl. Phys. 57, 59 (1985).
-
(1985)
J. Appl. Phys.
, vol.57
, pp. 59
-
-
Köhler, K.1
Coburn, J.W.2
Horne, D.E.3
Kay, E.4
Keller, J.H.5
-
24
-
-
0007642749
-
-
P. M. Meijer, J. D. P. Passchier, W. J. Goedheer, J. Bezemer, and W. G. J. H. M. van Sark, Appl. Phys. Lett. 64, 1780 (1994).
-
(1994)
Appl. Phys. Lett.
, vol.64
, pp. 1780
-
-
Meijer, P.M.1
Passchier, J.D.P.2
Goedheer, W.J.3
Bezemer, J.4
Van Sark, W.G.J.H.M.5
-
26
-
-
85033849706
-
-
Hiden Analytical Limited, Gemini Business Park, Warrington WA5 5TN, UK
-
Hiden Analytical Limited, Gemini Business Park, Warrington WA5 5TN, UK.
-
-
-
-
37
-
-
85033870802
-
-
Ph.D. thesis, Ecole Polytechnique de Palaiseau
-
C. Böhm, Ph.D. thesis, Ecole Polytechnique de Palaiseau, 1992.
-
(1992)
-
-
Böhm, C.1
|