Control of the ion flux and ion energy in CCP discharges using non-sinusoidal voltage waveforms

Journal of Physics D: Applied Physics

Volumn 45, Issue 39, 2012, Pages

  Lafleur, T ^a   Booth, J P ^a  

^a ECOLE POLYTECHNIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; CAPACITIVELY COUPLED; CONTROL MECHANISM; GAUSSIANS; GROUNDED ELECTRODES; ION ENERGIES; ION FLUXES; MAIN EFFECT; NEW FORMS; NON-SINUSOIDAL VOLTAGE; PARTICLE-IN-CELL SIMULATIONS; PHASE ANGLES; PRESSURE INCREASE; PULSEWIDTHS; REPETITION FREQUENCY; RF DISCHARGE; RF PLASMA; WAVE FORMS;

BIAS VOLTAGE; GROUNDING ELECTRODES; PLASMA APPLICATIONS; PLASMA DENSITY;

IONS;

EID: 84866359036     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/39/395203     Document Type: Article

References (31)

1. Donkó Z, Schulze J, Heil B G and Czarnetzki U 2009 J. Phys. D: Appl. Phys. 42 025205
2. Heil B G, Czarnetzki U, Brinkmann R P and Mussenbrock T 2008 J. Phys. D: Appl. Phys. 41 165202
3. Heil B G, Schulze J, Mussenbrock T, Brinkmann R P and Czarnetzki U 2008 IEEE Trans. Plasma Sci. 36 1404
4. Schulze J, Schüngel E and Czarnetzki U 2009 J. Phys. D: Appl. Phys. 42 092005
5. Schulze J, Schüngel E, Donkó Z and Czarnetzki U 2011 Plasma Sources Sci. Technol. 20 015017
6. Schulze J, Schüngel E, Czarnetzki U, Gebhardt M, Brinkmann R P and Mussenbrock T 2011 Appl. Phys. Lett. 98 031501
7. Zhang Q.Z., Zhao S.X., Jiang W. and Wang Y.N. 2012 J. Phys. D: Appl. Phys. 45 305203
8. Schüngel E, Schulze J, Donkó Z and Czarnetzki U 2011 Phys. Plasmas 18 013502
9. Donkó Z, Schulze J, Hartmann P, Korolov I, Czarnetzki U and Schüngel E 2010 Appl. Phys. Lett. 97 081501
10. Schulze J, Donkó Z, Schüngel E and Czarnetzki U 2011 Plasma Sources Sci. Technol. 20 045007
11. Johnson E V, Verbeke T, Vanel J C and Booth J P 2010 J. Phys. D: Appl. Phys. 43 412001
12. Johnson E V, Delattre P A and Booth J P 2012 Appl. Phys. lett. 100 133504
13. Johnson E V, Pouliquen S, Delattre P A and Booth J P 2012 J. Non-Cryst. Solids at press
14. Donkó Z, Schulze J, Czarnetzki U and Luggenhölscher D 2009 Appl. Phys. Lett. 94 131501
15. Lafleur T, Boswell R W and Booth J P 2012 Appl. Phys. Lett. 100 194101
16. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
17. Booth J P, Curley G, Marić D and Chabert P 2010 Plasma Sources Sci. Technol. 19 015005
18. Mussenbrock T and Brinkmann R P 2006 Appl. Phys. Lett. 88 151503
19. Vahedi V and DiPeso G 1997 J. Comput. Phys. 131 149 (Pubitemid 127341387)
20. Vahedi V and Surendra M 1995 Comput. Phys. Commun. 87 179
21. Phelps A V and Petrović Z Lj 1999 Plasma Sources Sci. Technol. 8 R21
22. Phelps A V 1994 J. Appl. Phys. 76 747
23. Birdsall C K and Langdon A B 1985 Plasma Physics Via Computer Simulation (New York: McGraw-Hill)
24. Donkó Z 2012 private communication
25. Godyak V A, Piejak R B and Alexandrovich B M 1992 Plasma Sources Sci. Technol. 1 36
26. Vender D and Boswell R W 1990 IEEE Trans. Plasma Sci. 18 725 (Pubitemid 20739176)
27. Surendra M and Graves D B 1991 IEEE Trans. Plasma Sci. 19 144 (Pubitemid 21660857)
28. Lafleur T and Boswell R W 2012 Phys. Plasmas 19 023508
29. Jiang W, Xu Xiang, Dai Z-L and Wang Y-N 2008 Phys. Plasmas 15 033502 (Pubitemid 351469838)
30. Schüngel E, Zhang Q-Z, Iwashita S, Schulze J, Hou L-J, Wang Y-n and Czarnetzki U 2011 J. Phys. D: Appl. Phys. 44 285205
31. Diomede P, Longo S, Economou D J and Capitelli M 2012 J. Phys. D: Appl. Phys. 45 175204