Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering

Thin Solid Films

Volumn 545, Issue , 2013, Pages 445-450

  Agnarsson, B ^a,c   Magnus, F ^a,d   Tryggvason, T K ^a   Ingason, A S ^a,e   Leosson, K ^a   Olafsson, S ^a   Gudmundsson, J T ^a,b  

^a UNIVERSITY OF ICELAND   (Iceland)

^b SHANGHAI JIAO TONG UNIVERSITY   (China)

^c CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^d UPPSALA UNIVERSITY   (Sweden)

^e LINKÖPING UNIVERSITY   (Sweden)

Author keywords

High power impulse magnetron sputtering; Magnetron sputtering; Optical properties; Reactive sputtering; Thin film growth; Titanium dioxide

Indexed keywords

GRAZING INCIDENCE X-RAY DIFFRACTOMETRY; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIGH REFRACTIVE INDEX; LOW GROWTH TEMPERATURE; OPTICAL CHARACTERISTICS; REACTIVE DC MAGNETRON SPUTTERING; SI (001) SUBSTRATE; TEMPERATURE RANGE;

FILM GROWTH; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDE MINERALS; REACTIVE SPUTTERING; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

TITANIUM DIOXIDE;

EID: 84884983116     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.07.058     Document Type: Article

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