Synthesis and properties of crystalline TiO 2 films deposited by a HIPIMS technique

Vacuum

Volumn 89, Issue 1, 2013, Pages 90-95

  Wang, Q M ^a,b   Kwon, Se Hun ^a   Hui, Kwun Nam ^a   Kim, Doo In ^a   Hui, Kwan San ^c   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

^b GUANGDONG UNIVERSITY OF TECHNOLOGY   (China)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Dielectric constant; High power impulse magnetron sputtering; Phase structure; Photocatalytic properties; TiO 2film

Indexed keywords

COATING SYSTEM; CRYSTALLINE-TIO; DEPOSITION PARAMETERS; GLASS SUBSTRATES; HIGH DIELECTRIC CONSTANTS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); OXYGEN DEFICIENCY; OXYGEN FLUXES; PHOTOCATALYTIC PROPERTY; PHOTOINDUCED HYDROPHILICITY; POTENTIAL APPLICATIONS; POWER PULSE; RUTILE FILMS; TIO; WORKING GAS PRESSURE;

CRYSTALLINE MATERIALS; DEPOSITS; OXIDE MINERALS; PERMITTIVITY; PHASE STRUCTURE; PHOTOCATALYSIS; SILICON; SUBSTRATES;

TITANIUM DIOXIDE;

EID: 84869095914     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.11.020     Document Type: Conference Paper

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