Uniformity, structure, and photocatalytic activity of TiO2 films deposited by atmospheric-pressure linear cold plasma

Chemical Vapor Deposition

Volumn 18, Issue 10-12, 2012, Pages 309-314

  Di, Lan Bo ^a,b   Shi, Chuan ^a   Li, Xiao Song ^a   Liu, Jing Lin ^a   Zhu, Ai Min ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b DALIAN UNIVERSITY   (China)

Author keywords

AP plasma CVD; Dielectric barrier discharge; TiO2 photocatalytic film

Indexed keywords

CHEMICAL BINDING; COLD PLASMA-CVD; COLD PLASMAS; CONTINUOUS FLOW REACTORS; DIELECTRIC BARRIER DISCHARGES; FOURIER TRANSFORM INFRARED; LEVELING OFFS; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC FILM; TIO; UV-VIS SPECTROSCOPY;

AMORPHOUS FILMS; ATMOSPHERIC CHEMISTRY; CALCINATION; DEPOSITS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOCATALYSIS; PHOTOELECTRONS; PLASMA CVD; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 84871343879     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201207007     Document Type: Article

References (33)

1. R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A. Kitamura, M. Shimohigoshi, T. Watanabe, Nature 1997, 388, 431.
2. A. Mills, S. LeHunte, J. Photochem. Photobiol. A 1997, 108, 1.
3. N. Ozer, C. M. Lampert, Sol. Energy Mater. Sol. Cells 1998, 54, 147.
4. E. W. McFarland, J. Tang, Nature 2003, 421, 616.
5. X. Chen, S. S. Mao, Chem. Rev. 2007, 107, 2891.
6. I. P. Parkin, R. G. Palgrave, J. Mater. Chem. 2005, 15, 1689.
7. K. L. Choy, Prog. Mater. Sci. 2003, 48, 57.
8. T. Busani, R. A. B. Devine, Semicond. Sci. Technol. 2005, 20, 870.
9. H. Szymanowski, A. Scobczyk, M. Gazicki-ipman, W. Jakubowski, L. Klimek, Surf. Coat. Technol. 2005, 200, 1036.
10. A. M. Zhu, L. H. Nie, X. L. Zhang, C. Shi, Z.M. Song, Y. Xu, Plasma Sci. Technol. 2004, 6, 2546.
11. L. H. Nie, C. Shi, Y. Xu, Q. H. Wu, A. M. Zhu, Plasma Process. Polym. 2007, 4, 574.
12. X. L. Zhang, L. H. Nie, Y. Xu, C. Shi, X. F. Yang, A. M. Zhu, J. Phys. D: Appl. Phys. 2007, 40, 1763.
13. A. M. Zhu, L. H. Nie, Q. H. Wu, X. L. Zhang, X. F. Yang, Y. Xu, C. Shi, Chem. Vap. Deposition 2007, 13, 141.
14. L. B. Di, X. S. Li, C. Shi, Y. Xu, D. Z. Zhao, A. M. Zhu, J. Phys.D: Appl. Phys. 2009, 42, 032001.
15. D. L. Chang, X. S. Li, T. L. Zhao, J. H. Yang, A. M. Zhu, Chem. Vap. Deposition 2012, 18, 121.
16. H. Seo, C. M. Elliott, H. Shin, ACS Appl. Mater. Interfaces 2010, 2, 3397.
17. J. L. Hodgkinson, H. M. Yates, D. W. Sheel, Plasma Process. Polym. 2009, 6, 575.
18. L. B. Di, X. S. Li, T. L. Zhao, D. L. Chang, Q.Q. Liu, A.M. Zhu, Plasma Sci. Technol. 2012, in Press.
19. C. V. Thompson, R. Carel, J. Mech. Phys. Solids 1996, 44, 657.
20. Q. Zhang, G. L. Griffin, Thin Solid Films 1995, 263, 65.
21. M. Sreemany, S. Sen, Mater. Chem. Phys. 2004, 83, 169.
22. Y. J. Sun, T. Egawa, L. Y. Zhang, X. Yao, Jpn. J. Appl. Phys. 2002, 41, L1389.
23. Z. Song, J. Hrbek, R. Osgood, Nano Lett. 2005, 5, 1327.
24. F. B. Li, X. Z. Li, Appl. Catal. A 2002, 228, 15.
25. Handbook of X-Ray Photoelectron Spectroscopy (Ed: J. Chastain), Perkin-Elmer Corporation, Physical Electronics Division, Eden Prairie MN, 1992.
26. H. Irie, Y. Watanabe, K. Hashimoto, J. Phys. Chem. B 2003, 107, 5483.
27. T. Ohsaka, F. Izumi, Y. Fujiki, J. Raman Spectrosc. 1978, 7, 321.
28. S. A. O'Neill, I. P. Parkin, R. J. H. Clark, M. Andrew, E. Nickolas, J. Mater. Chem. 2003, 13, 56.
29. M. Nakamura, S. Kaito, T. Aoki, L. Sirghi, Y. Hatanaka, J. Appl. Phys. 2001, 90, 3391.
30. M. Nakamura, T. Aoki, Y. Hatanaka, J. Mater. Res. 2001, 16, 621.
31. M. Nakamura, S. Kaito, T. Aoki, L. Sirghi, Y. Hatanaka, Thin Solid Films 2001, 401, 138.
32. K. Sakaguchi, K. Shimakawai, Y. Hatanakay, Jpn. J. Appl. Phys. 2006, 45, 4183.
33. C. Y. Wu, B. S. Chiang, S. Chang, D. S. Liu, Appl. Surf. Sci. 2011, 257, 1893.