Effect of annealing on the structural, electrical and optical properties of nanostructured TiO2 thin films

Crystal Research and Technology

Volumn 44, Issue 9, 2009, Pages 989-994

  Sankar, S ^a   Gopchandran, K G ^a  

^a UNIVERSITY OF KERALA   (India)

Author keywords

Optical constants; Porosity; TiO2 thin film

Indexed keywords

AFM; ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL STUDIES; NANOSTRUCTURED TIO; NANOSTRUCTURED TITANIUM; PULSED LASER ABLATION; REFRACTIVE INDEX DISPERSION; RUTILE PHASE; SEM; SINGLE OSCILLATORS; TIO; TIO2 THIN FILM; TRANSMISSION SPECTRUMS; UV VISIBLE SPECTROSCOPY; X-RAY DIFFRACTION STUDIES;

AMORPHOUS FILMS; ANNEALING; ELECTRIC NETWORK ANALYSIS; ELECTRIC PROPERTIES; LASER ABLATION; LIGHT TRANSMISSION; OPTICAL CONSTANTS; OXIDE MINERALS; PULSED LASER APPLICATIONS; REFRACTIVE INDEX; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; ULTRAVIOLET SPECTROSCOPY;

OPTICAL FILMS;

EID: 69549083096     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.200900073     Document Type: Article

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