Phase development in sputter deposited titanium dioxide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 772-776

  Wiggins, M D ^a   Nelson, M C ^a   Aita, C R ^a  

^a UNIVERSITY OF WISCONSIN MILWAUKEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000386894     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580387     Document Type: Article

References (5)

1. R.C. DeVries and R. Roy, Am. Ceram. Soc. Bull. 33, 370 (1954).
2. C.R. Aita, J. Vac. Sci. Technol. A 11, 1540 (1993).
3. D. Wickasana, A. Kobayashi, and A. Kibara, J. Vac. Sci. Technol. A 10, 1479 (1992).
4. K. Balasubramamian, X.F. Han, and K.H. Guenther, Appl. Opt. 32, 5594 (1993).
5. M.H. Suhail, G. Mohan Rao, and S. Mohan, J. Appl. Phys. 71, 1421 (1992).