Fabrication and characterization of hydrophilic TiO2 thin films on unheated substrates prepared by pulsed DC reactive magnetron sputtering

Journal of Nanomaterials

Volumn 2010, Issue , 2010, Pages

  Horprathum, M ^a   Chindaudom, P ^a   Limnonthakul, P ^b   Eiamchai, P ^a   Nuntawong, N ^a   Patthanasettakul, V ^a   Pokaipisit, A ^c,d   Limsuwan, P ^c,d  

^a NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

^b SRINAKHARINWIROT UNIVERSITY   (Thailand)

^c Thailand Ministry of Science and Technology   (Thailand)

^d KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL FACTORS; DEPOSITION TIME; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FILM DEPOSITION; FILM STRUCTURE; GLASS SLIDES; GRAZING-INCIDENCE X-RAY DIFFRACTION; OPERATING PRESSURE; PULSED DC; RUTILE PHASE; RUTILE PHASIS; TEM; TIO; UNHEATED SUBSTRATES; UV LIGHT; WATER CONTACT ANGLE MEASUREMENT;

AMORPHOUS FILMS; ANGLE MEASUREMENT; CONTACT ANGLE; DC POWER TRANSMISSION; FIELD EMISSION; FIELD EMISSION MICROSCOPES; HYDROPHILICITY; MORPHOLOGY; OPTICAL PROPERTIES; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPECTROSCOPIC ELLIPSOMETRY; SURFACE MORPHOLOGY; THIN FILMS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77956808686     PISSN: 16874110     EISSN: 16874129     Source Type: Journal    
DOI: 10.1155/2010/841659     Document Type: Article

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