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Thin Solid Films

Volumn 520, Issue 1, 2011, Pages 272-279

Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering

(7) Horprathum, M a Eiamchai, P a Chindaudom, P a Nuntawong, N a Patthanasettakul, V a Limnonthakul, P b Limsuwan, P c

a NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER (Thailand)

b SRINAKHARINWIROT UNIVERSITY (Thailand)

c KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI (Thailand)

Author keywords

Inhomogeneity; Spectroscopic ellipsometry; Sputtering; Titanium dioxide; Transmission electron spectroscopy

Indexed keywords

ANALYTICAL METHOD; DENSE STRUCTURES; ELLIPSOMETRIC DATA; EXPERIMENTAL PARAMETERS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FILM CRYSTALLINITY; GRAZING INCIDENCE X-RAY DIFFRACTION; INHOMOGENEITIES; INHOMOGENEOUS FILMS; MIRROR-LIKE SURFACE; OPERATING PRESSURE; PHYSICAL MODEL; POROUS STRUCTURES; PULSED DC; PULSED DC MAGNETRON SPUTTERING; ROUGH SURFACES; STRUCTURE ZONE MODEL; TIO; TRANSMISSION ELECTRON SPECTROSCOPY;

DC POWER TRANSMISSION; ELECTRON SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; SURFACE TOPOGRAPHY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TOPOGRAPHY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 80054034088 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.07.064 Document Type: Article

Times cited : (25)

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