Effects of depositing temperatures on structure and optical properties of TiO 2 film deposited by ion beam assisted electron beam evaporation

Applied Surface Science

Volumn 254, Issue 9, 2008, Pages 2685-2689

  Yang, Chen ^a   Fan, Huiqing ^a   Xi, Yingxue ^a   Chen, Jin ^a   Li, Zhuo ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Microstructure; Optical properties; Physical vapor deposition; TiO 2 thin films; X ray diffraction

Indexed keywords

DEPOSITION; ELECTRON BEAMS; EVAPORATION; ION BEAMS; OPTICAL PROPERTIES; PHYSICAL VAPOR DEPOSITION; THIN FILMS;

DEPOSITION TEMPERATURE; ELECTRON BEAM EVAPORATION; GLASS SUBSTRATES;

TITANIUM DIOXIDE;

EID: 38949200295     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.10.006     Document Type: Article

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