Structure and physical properties of W-doped HfO2 thin films deposited by simultaneous RF and DC magnetron sputtering

Surface and Coatings Technology

Volumn 232, Issue , 2013, Pages 46-52

  Lin, Su Shia ^a   Liao, Chung Sheng ^a  

^a NATIONAL CHI NAN UNIVERSITY   (Taiwan)

Author keywords

Film; Hydrophilicity; Sputtering; Transmission

Indexed keywords

AR PRESSURES; DC MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; STRUCTURE AND PHYSICAL PROPERTIES;

FILMS; HAFNIUM OXIDES; HYDROPHILICITY; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SPUTTERING; SURFACE ROUGHNESS; TRANSMISSIONS;

TUNGSTEN COMPOUNDS;

EID: 84883458729     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.04.051     Document Type: Article

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