Structure and morphological study of nanometer W and W3O thin films

Thin Solid Films

Volumn 428, Issue 1-2, 2003, Pages 237-241

  Maille L ^a   Sant, C ^a   Le Paven Thivet, C ^a   Legrand Buscema, C ^a   Garnier, P ^a  

^a UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

Author keywords

Atomic force microscopy; RF sputtering; Tungsten thin films; W micro structure; W3O micro structure; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; FILM GROWTH; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PRESSURE EFFECTS; SPUTTERING; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

POWER DENSITY;

THIN FILMS;

EID: 0037457154     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01277-4     Document Type: Conference Paper

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