Stress and morphological development of CdS and ZnS thin films during the SILAR growth on (1 0 0)GaAs

Applied Surface Science

Volumn 185, Issue 1-2, 2001, Pages 134-139

  Laukaitis, Giedrius ^a   Lindroos, Seppo ^b   Tamulevičius, Sigitas ^a   Leskelä, Markku ^b  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

CdS; Residual stress; SILAR; Thin films; ZnS

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CADMIUM SULFIDE; CRYSTAL ORIENTATION; ELECTRON SPECTROSCOPY; FILM GROWTH; INTERFEROMETRY; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; SEMICONDUCTING GALLIUM ARSENIDE; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

SUCCESSIVE IONIC LAYER ADSORPTION AND REACTION (SILAR) TECHNIQUES;

THIN FILMS;

EID: 0035965968     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00775-9     Document Type: Article

References (26)

1. Mechanical properties of non-metallic thin films
2. Optical thin films. II. New developments