Characterization of thin TiO2 films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applications

Thin Solid Films

Volumn 517, Issue 18, 2009, Pages 5409-5414

  Sobczyk Guzenda, A ^a   Gazicki Lipman, M ^a   Szymanowski, H ^a   Kowalski, J ^a   Wojciechowski, P ^a   Halamus, T ^a   Tracz, A ^b  

^a LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

^b CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Atomic force microscopy; Morphology; Optical properties; Radio frequency plasma enhanced chemical vapor deposition; Raman spectroscopy; Structural properties; Thin films; Titanium dioxide; Wetting

Indexed keywords

ABSORPTION SPECTROPHOTOMETRY; AMORPHOUS STRUCTURES; CRYSTALLINE FORM; OPTICAL PARAMETER; OPTICAL QUALITIES; PHOTOCATALYTIC APPLICATION; PHOTOCATALYTIC EFFECT; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; RADIO FREQUENCY PLASMA; RADIO-FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SHIFT; RAMAN SPECTRA; RF-POWER; THERMAL-ANNEALING; TIO;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; MORPHOLOGY; OPTICAL FILTERS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; OXIDE FILMS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SPECTRUM ANALYSIS; STRUCTURAL ANALYSIS; STRUCTURAL PROPERTIES; SURFACE TOPOGRAPHY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPOR DEPOSITION; VAPORS; WETTING;

OPTICAL FILMS;

EID: 65749100192     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.010     Document Type: Article

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