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Volumn 5, Issue 16, 2013, Pages 8067-8075

Boron-doped peroxo-zirconium oxide dielectric for high-performance, low-temperature, solution-processed indium oxide thin-film transistor

Author keywords

aqueous solution process; boron doped peroxo zirconium; hydrogen peroxide; indium oxide; thin film transistor

Indexed keywords

ATTENUATED TOTAL REFLECTANCE FOURIER TRANSFORM INFRARED SPECTROSCOPY; BORON-DOPED; C. THIN FILM TRANSISTOR (TFT); HIGH-RESOLUTION X-RAY DIFFRACTION; INDIUM OXIDE; POLYIMIDE SUBSTRATE; THERMOGRAVIMETRIC-DIFFERENTIAL THERMAL ANALYSIS; THIN-FILM TRANSISTOR (TFTS);

EID: 84883266186     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am402153g     Document Type: Article
Times cited : (117)

References (50)
  • 4
    • 33751555458 scopus 로고    scopus 로고
    • Keimer, B. Nature 2006, 5, 933-934
    • (2006) Nature , vol.5 , pp. 933-934
    • Keimer, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.