Aqueous inorganic inks for low-temperature fabrication of ZnO TFTs

Journal of the American Chemical Society

Volumn 130, Issue 51, 2008, Pages 17603-17609

  Meyers, Stephen T ^a   Anderson, Jeremy T ^a   Hung, Celia M ^b   Thompson, John ^c   Wager, John F ^b   Keszler, Douglas A ^a  

^a OREGON STATE UNIVERSITY   (United States)

^b Oregon State University   (United States)

^c HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; AQUEOUS INK; CONTROLLED PRECIPITATION; CURRENT SATURATION; ENHANCEMENT-MODE; FILM STRUCTURE; FUNCTIONAL TRANSISTORS; HIGH QUALITY; INK-JET; INK-JET PRINTING; LOW TEMPERATURES; LOW-TEMPERATURE FABRICATION; OXIDE ELECTRONICS; POLYCRYSTALLINE ZNO; SEMICONDUCTOR FILMS; SOLUTION-PROCESSING; STRONG FIELD; WURTZITE; ZNO; ZNO FILMS;

ALUMINA; DISSOLUTION; INK; METALLIC FILMS; PRINTING; SEMICONDUCTING ZINC COMPOUNDS; SPIN DYNAMICS; THIN FILM TRANSISTORS; TRANSISTORS; ZINC; ZINC SULFIDE;

ZINC OXIDE;

ALUMINUM OXIDE; CRYSTALLIN; INK; PHOSPHATE; ZINC OXIDE;

AQUEOUS SOLUTION; ARTICLE; DISSOLUTION; ELECTRON MICROSCOPY; ELECTRONICS; FILM; LOW TEMPERATURE; PRECIPITATION; PRINTING; PURIFICATION; SEMICONDUCTOR; STORAGE; X RAY DIFFRACTION;

EID: 67849106925     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja808243k     Document Type: Article

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