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Japanese Journal of Applied Physics

Volumn 52, Issue 6 PART 2, 2013, Pages

Phase imaging of extreme-ultraviolet mask using coherent extreme-ultraviolet scatterometry microscope

(5) Harada, Tetsuo a,c Nakasuji, Masato a,c Nagata, Yutaka b,c Watanabe, Takeo a,c Kinoshita, Hiroo a,c

a UNIVERSITY OF HYOGO (Japan)

b RIKEN (Japan)

c JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER PATTERN; COHERENT DIFFRACTION IMAGING; EXTREME ULTRAVIOLETS; FREQUENCY SPACES; INVERSE COMPUTATION; LINE-AND-SPACE PATTERNS; PHASE-SHIFTING MASK; RECONSTRUCTION ALGORITHMS;

DEFECTS; MASKS;

MICROSCOPES;

EID: 84880988833 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.7567/JJAP.52.06GB02 Document Type: Conference Paper

Times cited : (34)

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