EUVL alternating phase shift mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Yan, Pei Yang ^a   Myers, Alan ^a   Shroff, Yashesh ^a   Chandhok, Manish ^a   Zhang, Guojing ^a   Gullikson, Eric ^b   Salmassi, Farhad ^b  

^a INTEL CORPORATION   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

EUVL Alternating phase shift mask (EUVL APSM). Phase error; EUVL mask; EUVL multilayer; Extreme ultra violet lithography (EUVL)

Indexed keywords

ALTERNATING PHASE SHIFT MASKS; APSM MASKS; BINARY MASKS; BINARY STRUCTURES; DATA ANALYSIS; DEPTH OF FOCUS; EUVL MASK; EUVL MULTILAYER; EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL); EXTREME ULTRAVIOLETS; IMBALANCE COMPENSATION; LINEWIDTH ROUGHNESS; MASK DESIGN; MASK FABRICATION; OFF-AXIS ILLUMINATION; OPTICAL ENHANCEMENTS; PHASE DIFFERENCE; PHASE ERROR; PHASE GENERATION; PHASE MISMATCH; PHASE REGION; PHASE STEPS; PROCESS CONDITION; RESIST RESOLUTION; RESOLUTION IMPROVEMENT; STEP HEIGHT; WAFER LEVEL;

DATA REDUCTION; EXPERIMENTS; EXTREME ULTRAVIOLET LITHOGRAPHY; FABRICATION; MULTILAYERS; PHASE SHIFT; ROUGHNESS MEASUREMENT;

MASKS;

EID: 79957955165     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.884790     Document Type: Conference Paper

References (8)

1. M. D. Levenson, N. S. Viswanathan, R. A. Simpson, "Improving resolution in photolithography with a phase-shifting mask," IEEE Tran on Electron Device 29, 1828 (1982).
2. P. Y. Yan, "EUVL Alternating Phase Shift Mask Imaging Evaluation," Proc. SPIE 4889, 1099 (2002).
3. M. Sugawara, A. Chiba, H. Yamanashi, and I. Nishiyama, "Alternating Phase Shift Mask in Extreme Ultra Violet Lithography," Jpn. J. Appl. Phys. Vol 42, 3776 (2003).
4. M. Sugawara, A. Chiba, and I. Nishiyama, "Design of Phase Shift Masks in Extreme Ultraviolet Lithography," Jpn. J. Appl. Phys. 42, 2639 (2003).
5. S. Peng, "Through-Focus Image Balancing of Alternating Phase Shifting Masks," Proc. SPIE 3873, 328 (1999).
6. W. Maurer, C. Friedrich, L. Mader, and J. Thiele, "Proximity Effects of Alternating Phase Shift Masks." Proc. SPIE 3873, 328 (1999).
7. U. A. Griesinger, R. Pforr, J. Knobloch, and C. Friedrich, "Transmission and Phase Balancing of Alternating Phase Shift Masks (5X) - Theoretical and Experimental Results," Proc. SPIE 3873, 328 (1999).
8. K. Toh, G. Dao, R, Singh, and H. Gaw, "Chromeless Phase-Shift Masks: A New Approach to Phase Shifting Masks," Proc. SPIE 1496, 27 (1990).