EUVL alternating phase shift mask imaging evaluation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1099-1105

  Yan, Pei Yang ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; LITHOGRAPHY; MASKS; THIN FILMS;

ALTERNATING PHASE SHIFT MASK (APSM);

PHASE SHIFT;

EID: 0037627551     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468103     Document Type: Conference Paper

References (5)

1. M. Ito, S. Katagiri, H. Yamanashi, E. Seya, T. Ogawa, H. Oizumi, and T. Terasawa, "Optical Technology for EUV Lithography," OSA TOPS on Extreme Ultraviolet Lithography, Vol. 4, p9, 1996.
2. S. Peng, "Through-Focus Image Balancing of Alternating Phase Shifting Masks," SPIE Vol. 3873, p328, 1999.
3. W. Maurer, C. Friedrich, L. Mader, and J. Thiele, "Proximity Effects of Alternating Phase Shift Masks." SPIE Vol. 3873, p328, 1999.
4. U. A. Griesinger, R. Pforr, J. Knobloch, and C. Friedrich, "Transmission and Phase Balancing of Alternating Phase Shift Masks (5X) - Theoretical and Experimental Results," SPIE Vol. 3873, p328, 1999.
5. P. B. Mirkarimi, E. A. Spiller, D. G. Steans, V. Sperry, and S. L. Baker, "An Ion-Assisted Mo-Si Deposition Process for Planarizing Reticle Substrates for Extreme Ultraviolet Lithography," IEEE Journal of Quantum Electronics 37(12) p1514, 2001.