Design of phase-shift masks in extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 5 A, 2003, Pages 2639-2648

  Sugawara, Minoru ^a   Chiba, Akira ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Alternating phase shift mask; Attenuated phase shift mask; Printability; Resolution enhancement

Indexed keywords

ATTENUATION; GATES (TRANSISTOR); LIGHT REFLECTION; LITHOGRAPHY; PHASE SHIFT; ULTRAVIOLET RADIATION;

PHASE SHIFT MASKS;

MASKS;

EID: 0038719133     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.2639     Document Type: Article

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